Most photographers, pro and amateur, are quite rightly terrified to fish around inside their digital cameras. Whereas little could go wrong with a film camera that couldn't be fixed with a huff of ...
South Korean suppliers have developed a EUV pellicle with 90% transmittance. All aspects of the product have reached a level where mass production can begin at any moment. It's just one step away from ...
Extreme ultraviolet (EUV) lithography is moving closer to realization, but several problems involving scanner uptime, photoresists and pellicles need to be resolved before this long-overdue technology ...
Fujimura: Let’s talk about pellicles, a topic we’ve been exploring in the survey the past couple of years. Pellicles are protective membranes that shield photomasks from contaminants and defects ...
SAN JOSE, Calif. — Intel Corp. has made significant progress on the development of a pellicle for extreme ultraviolet (EUV) lithography photomasks, according to a presentation at the SPIE ...
Imec, the research and innovation hub in nanoelectronics and digital technologies, has announced promising results in extreme ultraviolet (EUV) reticle protection. Multiple CNT-based pellicles were ...
Samsung Electronics recently unveiled the current status and prospects of its extreme ultraviolet (EUV) exposure process, generating significant interest globally. Particularly noteworthy is Samsung's ...
Imec has had promising results in EUV reticle protection. Multiple CNT-based pellicles were mounted on reticles and exposed in the NXE:3300 EUV scanner at imec, demonstrating the successful ...
VANTAA, Finland, Oct. 24, 2025 (GLOBE NEWSWIRE) -- Canatu has granted a commercial production license for the first CNT100 SEMI reactor to Korean semiconductor company FINE SEMITECH CORPORATION ...
Some results have been hidden because they may be inaccessible to you
Show inaccessible results