OYAMA, Japan--(BUSINESS WIRE)--Gigaphoton Inc., a leading manufacturer of light sources used in lithography, has announced that in the field of Laser-Produced Plasma (LPP) light sources for EUV ...
The future of computing depends on miniaturization, and extreme ultraviolet lithography (EUV) is one key enabler. Until recently, we have relied on low numerical aperture (NA) EUV systems with an ...
Extreme ultraviolet lithography (EUVL) has emerged as a cornerstone technology in the semiconductor industry, enabling the production of devices with sub-10 nm feature sizes. By utilising a 13.5 nm ...
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